High-k and ALD/CVD Metal Precursor Market is Booming Worldwide According to a New Research Report
Category: #Technology  By Ronak Bora  Date: 2021-03-23
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High-k and ALD/CVD Metal Precursor Market is Booming Worldwide According to a New Research Report

Surging demand for processes that aid the manufacturing of thin films is set to drive high-k and ALD/CVD metal precursor market growth. Atomic Layer Deposition (ALD) is the subcategory of the Chemical Vapor Deposition (CVD) process, which is used to manufacture thin films that exhibit these desired properties.

Industry participants are focused on producing dielectric, optical, and hybrid organic-inorganic films to decrease manufacturing costs. Meanwhile, favorable regulatory policies undertaken by the governments are also expected to fuel High-k and ALD/CVD Metal Precursor Market growth.

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The advent of advanced device shrinking technologies such as ALD and CVD has enabled manufacturers to design thin films with high aspect ratios. A large number of manufacturers are replacing poly-Si with platinum as a potential electrode and substituting commonly used SiO2 with dielectric materials like hafnium and silicon compounds. Metal-organic compounds will continue to gain recognition as a metal precursor on account of low thermal stability.

High-k gates technology segment was valued at more than US$33 million in 2015 and is projected to witness a CAGR of around 23% through 2024. The product demand will be largely influenced by the need for accurate and timely translation of large amounts of data used across various industries.

Electronics manufacturers have been making substantial research and development efforts in recent years, which has allowed them to build high-purity advanced metal precursors that can help meet different process requirements. The fabrication of semiconductors faster, cost-effectively, and seamlessly requires a more complex 3D structure, which is likely to augment demand for high-k layer and vapor deposition technology in the coming years.

List of the Key Companies that are Operating in the High-k and ALD/CVD Metal Precursor Market. They are as follows:

Adeka Corporation, AFC Hitech, AG Semiconductor Devices, Air Liquide, Air Products and Chemicals, Colnatec, Praxair, Dynamic Network Factory Inc., DNF, Dow Chemical, JSR Corporation, Linde, NANMAT, OCI Materials, REC, Samsung Electronics, Soulbrain, Strem Chemicals Inc., Tri Chemical Laboratories Inc., Union Pacific Chemicals

The industry requires collaborations across the entire value chain both in terms of new molecules and hardware to deliver chemicals into the equipment more efficiently. Future trends in chemical designs will witness growing role of intellectual property rights protection measures.

In terms of the regional landscape, U.S. high-k & ALD/CVD metal precursor industry size was valued at US$30 million in 2015 and is expected to witness steady growth in the forthcoming years. Expansion of the regional microelectronics and nanotechnology, due to complexities in semiconductor manufacturing and transition to 450mm wafers processing technology will complement the regional outlook.

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Table Of Content:

Chapter 4         High-k and ALD/CVD Metal Precursor Technology Insights

4.1         High-k and ALD/CVD metal precursor market share by technology, 2015 & 2024

4.2         Interconnect

4.2.1   Market estimates by region, 2013 - 2024

4.3         Memory/Capacitor

4.3.1   Market estimates by region, 2013 - 2024

4.4         Gates

4.4.1   Market estimates by region, 2013 - 2024

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About Author

Ronak Bora    

Ronak Bora

A graduate in Electronics Engineering, Ronak writes for Technology Magazine and carries a rich experience in digital marketing, exploring how the online world works from a technical and marketing perspective. His other areas of interest include reading, music, and spo...

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